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Organizational Structure

International Scientific Committee (ISC)

Strategic Partners

Research Groups

Senior Researchers

Functional Materials Technology Group
Optical Nanocharacterization Group
Inverse Materials Design Group
Next-Generation Energy Systems Group
Biophotonic Applications Group
Solar Energy Conversion Group
Oxide Single Crystals Group

A3B5 Compound Semiconductors Group

Functional Materials Laboratory

Oxide Single Crystals Laboratory

Materials Characterization Laborator y

III-V Compound Semiconductors Laboratory

Contact

Ensemble3 sp. z o.o.

01-919 Warsaw
133 Wólczyńska St.

NIP 1182211096

KRS 0000858669

contact@ensemble3.eu

Characterization

Leadership and Mental Health Awareness in Science and Education

June 24th, 2025 – Online Event This event aims to foster open discussions on how

Scanning electrochemical microscope

The scanning electrochemical microscope (SECM) could examine electrochemistry at high resolution near interfaces. By detecting

Prototype Pump Probe system

The aim of the prototype of the Super Resolution Broadband Ultrafast Microscopy technique is to

Photoelectric spectrometer

Photoelectric Spectrometer serves as a scientific tool to automatically characterize the photoelectric properties of samples

Scattering-type Scanning Near-field Microscope NeaSNOM by neaspec.

Our special s-SNOM, equipment worth >1M EUR enables near-field imaging and nanospectroscopy in transmission and

Surface Plasmon Resonance Spectrometer ResTec SPR RT-08

Our Surface Plasmon Resonance (SPR) Spectrometer enables us to perform highly-sensitive, non-label analysis for the

HORIBA LabRAM HR Evolution.

The LabRAM HR Evolution system is ideally suited to both micro and macro measurements (Raman and photoluminescence),

AIST-NT SmartSPM Scanning Probe Microscope

The LABRAM microscope is fully integrated with an AIST-NT SmartSPM Scanning Probe Microscope which offers

UV-Visible-NIR Microspectrophotometer CRAIC

The microspectrophotometer enables acquisition of spectra with extremely small sample areas non-destructively. Measurements can be

ThermoScientific Nicolet iS50 FTIR Spectrometer paired with Nicolet Continuµm IR Microscope.

This is a FTIR microspectrophotometer for spectroscopy (transmission and reflection mode) measurements at near/middle/far infrared

Double-beam Spectrophotometers Jasco v650.

The high sensitivity of the used detector and high spectral resolution (0.05nm) enables measurements of low

Time-Resolved Confocal Microscope Picoquant MicroTime 200

This microscope can analyze a multitude of parameters down to the single molecule level using methods

Photoluminescence Measurements

These measurements employ an in-house built photoluminescence system with double grating monochromator HR 460 and

The Photoelectrochemical (PEC) Characterization Equipment

Complex photoelectrochemical characterization can be performed with the CHI-660D electrochemical workstation by CH Instruments using

SmartLab 3kW X-ray powder Diffractometers Rigaku (Ł-IMiF)

X-ray universal powder Diffractometer Rigaku SmartLab 3kW with a vertical goniometer and Cu monochromated radiation. The diffractometer

Scanning Electron Microscope (SEM) (Ł-IMiF)

The Carl Zeiss AURIGA workstation is a sophisticated multi-functional platform based on a high-performance field

X-ray photoelectron spectroscopy (XPS), KRATOS AXIS Supra (Ł-IMiF)

X-ray photoelectron spectroscopy (XPS) is a surface sensitive analytical technique. A sample is irradiated with

Secondary Ion Mass Spectrometry (SIMS), CAMECA IMS SC Ultra (Ł-IMiF)

SIMS is a very precise surface sensitive analytical technique. A sample is bombarded with a

UVISEL 2 Spectroscopic Ellipsometer, HORIBA (Ł-IMiF)

The UVISEL 2 spectroscopic ellipsometer, manufactured by HORIBA (Jobin Yvon), covers a wide spectral range from

Atomic Force Microscope (AFM), Dimension FastScan with ScanAsyst, Bruker, (Ł-IMiF)

The AFM is a type of scanning probe microscopy (SPM) which allows producing microscopic maps

Tensiometer Lauda TD3 (Ł-IMiF)

The ring/plate method of measuring the surface and interfacial tension of liquids is an established method

Thermovision Camera Thermosensorik6 640SM, (Ł-IMiF)

Matrix of the camera is made of InSb. detection range: 1.1-5.3 µm, matrix size: 640 x

HMS-5500 Hall Effect Measurement Systems, Ecopia (Ł-IMiF)

The HMS-5500 Hall Effect Measurement Systems plot concentration versus temperature, mobility versus temperature, resistivity versus temperature,

FT-IR Spectrometer VERTEX 80v – Bruker Optic GmbH (Ł-IMiF)

This spectrometer works in spectral range from 25000 cm-1 to 10 cm-1 with resolution up

Profilometer DEKTAK 150 Veeco (Ł-IMiF)

This equipment is fully integrated with a motorized XY stage which performs a surface profile

Leadership and Mental Health Awareness in Science and Education

June 24th, 2025 – Online Event This event aims to foster open discussions on how leadership can support mental health

Cyberstar Micro-Pulling Down System (m-PD)

The micro-pulling down system is of very high quality, and was built by Cyberstar (France) – a well-known company producing

Crystal Systems Corporation Four Mirror Furnace (FZ-T-12000-X-VII-VPO-PC)

The four Mirror Furnace is a floating-zone (crucible-free) furnace for melting of extremely high temperature materials (up to 3000°C). The

In-House built micro-pulling down apparatus for low melting materials

Recently, in IMIF, a furnace with a resistive heater has been especially designed for fabrication of single crystals with low

In house-built Composites Thin Layers Furnace

This is an apparatus designed and manufactured in IMIF for manufacturing thin layers of eutectic composites. The novel method is

Vertical Furnace for High Q-factor Whispering Gallery Mode Microresonators

The short vertical furnace was made in ITME to obtain high Q-factor Whispering Gallery Mode microresonators in the form of

Czochralski Crystal Growth Systems

The Czochralski pullers for oxide single crystal growth with melting temperatures up to 2100°C, made by Cyberstar are located at

Physical Vapour Transport (PVT) Growth System

The silicon carbide crystal growth equipment at DFM-ITME, comprises 3 furnaces for silicon carbide crystal growth by the PVT method.

Liquid-encapsulated Czochralski (LEC) Growth System

These are Mark IV pullers for crystallization of AIIIBV group semiconducting compounds such as phosphides, antimonides or arsenides (i.e. GaP,

Sputtering SYSTEM ULVAC SBR-230 6E (Ł-IMiF)

A system for the application of polycrystalline and amorphous layers by the sputtering method. It has the possibility of deposition directly from targets (possibility

Vacuum duster INEGRITY 29, Denton Vacuum (Ł-IMiF)

The device provides the facilities to sputtering monolayer and multilayer coatings which can be used as electrical or thermal contacts, insulating

Crystal growth