Crystal growth

Cyberstar Micro-Pulling Down System (m-PD)

The micro-pulling down system is of very high quality, and was built by Cyberstar (France) – a well-known company producing

The four Mirror Furnace is a floating-zone (crucible-free) furnace for melting of extremely high temperature materials (up to 3000°C). The

Recently, in ITME, a furnace with a resistive heater has been especially designed for fabrication of single crystals with low

This is an apparatus designed and manufactured in ITME for manufacturing thin layers of eutectic composites. The novel method is

The short vertical furnace was made in ITME to obtain high Q-factor Whispering Gallery Mode microresonators in the form of

Czochralski Crystal Growth Systems

The Czochralski pullers for oxide single crystal growth with melting temperatures up to 2100°C, made by Cyberstar are located at

The silicon carbide crystal growth equipment at DFM-ITME, comprises 3 furnaces for silicon carbide crystal growth by the PVT method.

These are Mark IV pullers for crystallization of AIIIBV group semiconducting compounds such as phosphides, antimonides or arsenides (i.e. GaP,

A system for the application of polycrystalline and amorphous layers by the sputtering method. It has the possibility of deposition directly from targets (possibility

The device provides the facilities to sputtering monolayer and multilayer coatings which can be used as electrical or thermal contacts, insulating

Scattering-type Scanning Near-field Microscope NeaSNOM by neaspec.

Our special s-SNOM, equipment worth >1M EUR enables near-field imaging and nanospectroscopy in transmission and

Our Surface Plasmon Resonance (SPR) Spectrometer enables us to perform highly-sensitive, non-label analysis for the

HORIBA LabRAM HR Evolution.

The LabRAM HR Evolution system is ideally suited to both micro and macro measurements (Raman and photoluminescence),

The LABRAM microscope is fully integrated with an AIST-NT SmartSPM Scanning Probe Microscope which offers

The microspectrophotometer enables acquisition of spectra with extremely small sample areas non-destructively. Measurements can be

This is a FTIR microspectrophotometer for spectroscopy (transmission and reflection mode) measurements at near/middle/far infrared

The high sensitivity of the used detector and high spectral resolution (0.05nm) enables measurements of low

This microscope can analyze a multitude of parameters down to the single molecule level using methods

Photoluminescence Measurements

These measurements employ an in-house built photoluminescence system with double grating monochromator HR 460 and

Complex photoelectrochemical characterization can be performed with the CHI-660D electrochemical workstation by CH Instruments using

Monochromator Andor Shamrock 750

This is universal device for optical measurements in the spectral range from 400 to 2000

X-ray universal powder Diffractometer Rigaku SmartLab 3kW with a vertical goniometer and Cu monochromated radiation. The diffractometer

The Carl Zeiss AURIGA workstation is a sophisticated multi-functional platform based on a high-performance field

X-ray photoelectron spectroscopy (XPS) is a surface sensitive analytical technique. A sample is irradiated with

SIMS is a very precise surface sensitive analytical technique. A sample is bombarded with a

The UVISEL 2 spectroscopic ellipsometer, manufactured by HORIBA (Jobin Yvon), covers a wide spectral range from

The AFM is a type of scanning probe microscopy (SPM) which allows producing microscopic maps

Tensiometer Lauda TD3 (Ł-ITME)

The ring/plate method of measuring the surface and interfacial tension of liquids is an established method

Matrix of the camera is made of InSb. detection range: 1.1-5.3 µm, matrix size: 640 x

The HMS-5500 Hall Effect Measurement Systems plot concentration versus temperature, mobility versus temperature, resistivity versus temperature,

This spectrometer works in spectral range from 25000 cm-1 to 10 cm-1 with resolution up

Profilometer DEKTAK 150 Veeco (Ł-ITME)

This equipment is fully integrated with a motorized XY stage which performs a surface profile

Any changes inside material are always associated with the exchange (emission or absorption) heat. The

Characterization

Facilities

ENSEMBLE³ CoE will use the existing infrastructure and equipment available at Ł-ITME and UW. DAP is the head of the Department of Functional Materials at Łukasiewicz - Institute of Microelectronics and Photonics and the leader of the Laboratory of Materials Technologies at the Chemistry Department at UW. The comprehensive infrastructure and personnel of both institutions will provide know-how, expertise and equipment in crystal growth, development of materials technologies and optoelectronics at Ł-IMIF, while UW will supply optical characterization of materials, nanotechnologies, molecular biology and biotechnology. The combination of the strategic partners also enables direct access to modern and well-equipped scientific infrastructure which greatly increases the research opportunities of the CoE. Few of the relevant equipment have been listed below.

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