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Functional Materials Technology Group
Optical Nanocharacterization Group
Inverse Materials Design Group
Next-Generation Energy Systems Group
Biophotonic Applications Group
Solar Energy Conversion Group
Oxide Single Crystals Group
A3B5 Compound Semiconductors Group
Functional Materials Laboratory
Oxide Single Crystals Laboratory
Materials Characterization Laboratory
III-V Compound Semiconductors Laboratory
Contact
Ensemble3 sp. z o.o.
01-919 Warsaw
133 Wólczyńska St.
NIP 1182211096
KRS 0000858669
X-ray photoelectron spectroscopy (XPS), KRATOS AXIS Supra (Ł-IMiF)
X-ray photoelectron spectroscopy (XPS) is a surface sensitive analytical technique. A sample is irradiated with a beam of X-rays which then causes an emission of electrons. Their number and kinetic energies are measured which provide information about elemental composition, chemical and electronic state of a sample. The 500 mm Rowland circle monochromated Al Kα X-ray source provides high sensitivity and very high energy resolution which allows detection of elements in parts per thousand range and unambiguous identification of chemical shifts. Additionally, equipped with Ar ion gun which enables depth profiling and sample cleaning.
